INFLUENCE OF THE DEGREE OF OXYGEN-SILICON FRAMEWORK BONDING ON PROPERTIES OF SILICATE GLASSES AT HIGH PRESSURES

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dc.contributor.authorKuryaeva R.G.
dc.contributor.authorKirkinskii V.A.
dc.date.accessioned2021-02-26T12:28:01Z
dc.date.available2021-02-26T12:28:01Z
dc.date.issued2001
dc.identifierhttps://elibrary.ru/item.asp?id=13388943
dc.identifier.citationGeochemistry International, 2001, 39, 3, 307-310
dc.identifier.issn0016-7029
dc.identifier.urihttps://repository.geologyscience.ru/handle/123456789/25769
dc.titleINFLUENCE OF THE DEGREE OF OXYGEN-SILICON FRAMEWORK BONDING ON PROPERTIES OF SILICATE GLASSES AT HIGH PRESSURES
dc.typeСтатья

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