INFLUENCE OF THE DEGREE OF THE OXYGEN-SILICON FRAMEWORK BONDING ON PROPERTIES OF SILICATE GLASSES AT HIGH PRESSURES

dc.contributor.authorKuryaeva R.G.
dc.contributor.authorKirkinskii V.A.
dc.date.accessioned2021-04-10T07:00:44Z
dc.date.available2021-04-10T07:00:44Z
dc.date.issued2001
dc.identifierhttps://www.elibrary.ru/item.asp?id=36181446
dc.identifier.citationGeohimiya, 2001, 39, 3, 349-352
dc.identifier.issn0016-7525
dc.identifier.urihttps://repository.geologyscience.ru/handle/123456789/27612
dc.titleINFLUENCE OF THE DEGREE OF THE OXYGEN-SILICON FRAMEWORK BONDING ON PROPERTIES OF SILICATE GLASSES AT HIGH PRESSURES
dc.typeСтатья

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